Handbook of crystal growth : Thin films and epitaxy / Growth mechanisms and dynamics / D. T. J. Hurle
By: Hurle, D. T. J
Material type: 
TextLanguage: Spanish Publisher: New York : North-Holland, 1994Description: 1065 pISBN: 0444815562Subject(s): CristalografíaDDC classification: 548.5 | Item type | Current location | Collection | Call number | Vol info | Copy number | Status | Date due | Barcode |
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Libro OptoElectrónica
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Laboratorio de Optoelectrónica RESERVA | Papel | 548.5 H965 (Browse shelf) | Vol. 3 | Ej. 1 | Available | L000411 |
Browsing Laboratorio de Optoelectrónica shelves, Shelving location: RESERVA, Collection: Papel Close shelf browser
| 546.681 M365 Activated carbon / | 548.5 B993 Crystal growth technology / | 548.5 G539 Growth of crystals / | 548.5 H965 Handbook of crystal growth : | 548.5 H965 Handbook of crystal growth : | 548.5 M992 The atomistic nature of crystal growth / | 548.8 R685 Estados de la materia / |
Parte B. Growth mechanisms and dynamics
1. Kinetic processes in vapour growth 2. Organometallic vapor phase epitaxy reaction kinetics 3. Transport phenomena in vapor phase epitaxy reactors 4. Atomic layer epitaxy 5. Nucleation and surface diffusion in molecular beam epitaxy 6. Migration-enhanced epitaxy 7. Metalorganic vapour phase epitaxial growth of ultra-thin quantum wells and heterostructures 8. Photoassisted epitaxy 9. In situ óptical studies of epitaxial growth 10. Atomic mechanisms in semiconductor liquid phase epitaxy 11. Artificial epitaxy(Graphoepitaxy) 12. Structural effects in coherent epitaxial semiconductor films
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